The Laboratory for Interdisciplinary LIThography (LILIT) and microfabrication beamline are dedicated to the development, micro- and nano-fabrication of micro-nanosystems.
The laboratory is structured on two basic technologies: Proximity X-ray Lithography and e-beam Lithography.
The first one is developed at the LILIT beamline while e-beam lithography is performed at two lithographic systems: the first, located at ELETTRA is a Jeol 6400, while the second, a LION 5, is located at a the INFM National Nanotechnology Laboratory in Lecce.
These facilities allow maximum flexibility in the contemporary optimisation of lateral resolution and height of the lithographic structures and allow the development of multilevel processes.
At the laboratory are also available the most important techniques for fabrication, deposition and chemical-physical treatment:
Most of the instrumentation is located in a clean room (class below 100).
contact (Enzo DiFabrizio) not found!
ROMANATO Filippo
email romanato@tasc.infm.it
tel: multiple phone numbers