Seminars Archive

Photoelectron micro-spectroscopy with a laser-plasma x-ray source

Abstract
A laboratory size photoelectron micro-spectroscopy system is proposed at the Electrotechnical Laboratory, and is being developed under the collaboration with Nikon corp. In our scheme, the x-ray source is monochromitized without the use of a grating, x-ray beam will be focused on sample with an x-ray multilayer-coated Schwarzschild optic, and electron spectrum is analyzed by the time-of-flight (TOF) method. A Schwarzschild optic of sub-micron resolution is not yet tried, but we confirmed that the energy resolution is as good as 0.5 eV, and that photon flux on sample should be 10 E5photons/shot for 500 nm spot estimated from a 2D-mapping experiment with a 60-micron spot size. Further development should make our system as fast as a system with undulator radiation source in obtaining photoelectron spectra.