Seminars Archive
Yoshio Watanabe
Abstract
Wednesday, March 1, 2000, 14:30
Seminar Room, ground floor, Building "T"
Sincrotrone Trieste, Basovizza
I.D. required for external visitors
Application of Synchrotron Radiation to Characterization of Nanostructures.
Yoshio Watanabe
(Basic research Laboratories, Nippon Telegraph and Telephone
Corporation, Japan)
ABSTRACT
Fabrication technology at the nanometer scale to develop advanced devices
and low-dimensional structures requires atomic-scale control of thin-film
growth, selective-area growth, and ultra-fine photolithography. To develop
such atomic-scale control techniques, advanced characterization at the
atomic-scale is needed. We are now investigating surface and interface
structures and ways to control growth modes by surface modification, and
also trying to develop methods that allow real-time observation of thin-film
crystal growth by using synchrotron radiation photoelectron spectroscopy.
This seminar presents recent results obtained by these techniques for InAs
nanocrystals on GaAs, and also presents results for real-time crystal growth
observation.
