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Introduction |
Description |
Operation modes |
XPEEM and LEEM methods
Elmitec SPELEEM III microscope:
Cathode lens: magnetic triode
Beam separator: 120° symmetry
Energy analyser: hemispherical; two selectable slits for energy resolution of 300 and 600 meV
Contrast aperures: 20, 30 and 100µm [used to set resolution and transmission of the microscope]
illumination aperures: 2, 5 and 20µm
Angle of incidence photon beam - sample: 16° with the vertical plane.
[beamline specifications can be found here]
Performance:
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operation mode
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lateral resolution
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energy resolution
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field of view
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XPEEM spectral imaging:
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40 nm
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300 meV
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1.5 to 8 µm
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XAS/XMCD/XMLD imaging:
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40/50 nm
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200 meV @ 600 eV
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1.5 to 8 µm
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LEEM imaging:
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12 nm
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-
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1.5 to 50 µm
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micro-XPS:
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restricted to 2µm
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200 meV
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-
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micro-XPD/ARPES/ARUPS:
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restricted to 2µm
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300 meV
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-
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Sample stage specifications
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Samples must be conductive. All details about the sample size and the available sample cartidges can be found here.
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Sample heating:
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radiative
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Tmax=700°K
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e-beam (100 mA, 1200V)
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Tmax=1300°K [imaging]
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" "
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Tmax: more than 2000°K [flashes only]
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sample cooling:
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LN manipulator
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Tmin=150°K
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| The sample temperature is read by a type C thermocouple (W5%Re/W26%Re), which is mounted close to the sample, or with an optical pyrometer. The calibration parameters can be found here. A calibration table is also available. |
Available facilities
Hg lamp.
Gas line with two precision leak valves.
e-beam evaporators (Omicron and Elmitec).
One retractable stage for mounting e-beam evaporators without breaking vacuum.
Sample parking stage with 3 slots for sample cartridges.
Magnetisation stage [click here to read the field vs. current calibration table].
Preparation chamber with Ar sputtering and sample heater (up to 3 cartridges).
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References
Photoemission electron microscopy with chemical sensitivity: SPELEEM methods and applications;
A. Locatelli, L. Aballe, T.O. Menteş, M. Kiskinova, E. Bauer;
Surface and Interface Analysis 38, 1554-1557 (2006).
view article
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