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SPELEEM microscope (first branchline microscope)
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Cathode lens: magnetic triode
Beam separator: 120° symmetry
Energy analyser: hemispherical; two selectable slits for energy resolution of 300 and 600 meV
Contrast aperures: 20, 30 and 100µm [used to set resolution and transmission of the microscope]
illumination aperures: 2, 5 and 20µm
Angle of incidence photon beam - sample: 16° with the vertical plane.
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operation mode
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lateral resolution
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energy resolution
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field of view
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XPEEM spectral imaging:
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40 nm
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300 meV
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1.5 to 8 µm
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XAS/XMCD/XMLD imaging:
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40/50 nm
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200 meV @ 600 eV
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1.5 to 8 µm
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LEEM imaging:
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12 nm
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-
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1.5 to 50 µm
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micro-XPS:
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restricted to 2µm
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200 meV
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-
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micro-XPD/ARPES/ARUPS:
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restricted to 2µm
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300 meV
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-
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Beamline: insertion device
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| source: |
2 Apple II type undulators 10 cm period,
with phase modulation electromagnet |
| polarisation: |
linear horizontal, linear vertical, elliptical |
| energy range: |
5-1000 eV |
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grating
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energy range
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resolving power
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maximum flux
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VLS 400
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200-1000 eV
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4000 @ 400eV
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more than 1·1012 photon/sec [250-600eV]*
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VLS 200
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50-300eV
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4000 @ 200eV
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more than 1·1013 photon/sec [100-200eV]*
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SG10
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5-20eV
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1000 @ 20eV
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−
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(*) at 200mA ring current, 2.0 GeV; 10 μm exit slit width.
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