Welcome to DXRL @ Elettra

Deep X-ray lithography (DXRL) allows the production of high aspect ratio three dimensional structures in polymer with quasi perfect side-wall verticality and optical quality roughness. These structures can then be used as templates to mass-produce microparts made out of a large variety of metals, alloys or ceramics. The technique used to fabricate these parts is called LIGA.
It opens a wide variety of potential applications in the field of microelectromechanical systems (MEMs), fibre and integrated optics, microfluidic devices and interconnection technology. Moreover, the beamline performs an irradiaiton of samples with controlled X-ray doses, allowing therefore material science studies and the fabrication of microdevices made of new materials.


Research Highlights

Nanocrystal Film Patterning by Inhibiting Cation Exchange via Electron-Beam or X-ray Lithography

In this Letter we report patterning of colloidal nanocrystal films that combines direct e-beam (electron beam) writing with cation exchange.
  Karol Miszta   et al, Nano Lett., 2014, 14 (4), pp 2116–2122, DOI:10.1021/nl500349j.

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Exfoliated Graphene into Highly Ordered Mesoporous Titania Films: Highly Performing Nanocomposites from Integrated Processing

 We have designed an integrated process to obtain mesoporous graphene nanocomposite films.
 Luca Malfatti et al. ACS Appl. Mater. Interfaces, 2014, 6 (2), pp 795–802 , DOI: 10.1021/am4027407

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Microfabrication of sharp blazed gratings by a two-step height amplification process based on soft and deep X-ray lithography

We describe a scheme for the fabrication of sharp blazed gratings involving two cascaded steps of X-ray lithography (XRL) with electroplating (EP) steps interposed.
  Grenci, G. et al, (2014)  Sensors and Actuators, A: Physical Volume 205, 2014, Pages 111-118

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User Area

Proposal Submission

We invite users and industrial customers to contact

benedetta.marmiroli@elettra.eu     (TU Graz)

Horizon 2020
Do you want to be our  research partner?


How to get an official beamtime to a multiple technique facility including DXRL 


The new  125  NIST  4" Mask Holder has been installed 



MNE 2017 

Last Updated on Monday, 19 December 2016 14:52