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Nanocrystal Film Patterning by Inhibiting Cation Exchange via Electron-Beam or X-ray Lithography

In this Letter we report patterning of colloidal nanocrystal films that combines direct e-beam (electron beam) writing with cation exchange.

Karol Miszta   et al, Nano Lett., 2014, 14 (4), pp 2116–2122, DOI:10.1021/nl500349j.

The e-beam irradiation causes cross-linking of the ligand molecules present at the nanocrystal surface, and the cross-linked molecules act as a mask for further processing. Consequently, in the following step of cation exchange, which is performed by directly dipping the substrate in a solution containing the new cations, the regions that have not been exposed to the electron beam are chemically transformed, while the exposed ones remain unchanged.

Picture: Nanocrystal irradiation process.

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Karol Miszta   et al, Nano Lett., 2014, 14 (4), pp 2116–2122, DOI:10.1021/nl500349.
Ultima modifica il Mercoledì, 31 Dicembre 2014 12:10