Specifications


Specifications

General Properties
Beamline Energy Range6 - 20 [keV]
Max Flux On Sample10 * 1011 [ph/s] @ 9 [keV]
Spot Size On Sample Hor300 - 2000 [um]
Spot Size On Sample Vert300 - 1000 [um]
Divergence Hor0.1 - 1 [urad]
Divergence Vert0.05 - 0.3 [urad]
Control And Data Analysis
Control Software TypeIn house developed software written in Python/PyQt
Data Output Type1D and 2D Diffraction patterns
Data Output Formatascii (xy, gsas), tiff
Softwares For Data AnalysisPDF4, GSAS, FullProf, Elin



Photon Sources

Bending magnet 2.0

TypeBending Magnet
Source Size SigmaX = 139 [um], Y = 28 [um]

Bending magnet 2.4

TypeBending Magnet
Source Size SigmaX = 197 [um], Y = 30 [um]



Monochromators

Monochromator

Energy Range6 - 20 [keV]
TypeCrystal monochromator: Si 111
Pre-focusing Mirror Typecilndrical
Refocusing Mirror Typecilindrical



Endstations or Setup

Diffractometer

Description4 circle diffractometer with xyz translation stage. Other availble equipment for this set-up ; Gasblower (max 1000°C), Cryojet (Min.100K), cooling/heating chamber (Min -20°C - Max 130°C)
DiffractometerHuber 4-circle diffractometer with 3D translation stage
Detectors Availablefast scintillator detector
Silicon Drift Detector
marCCD
Endstation OperativeYes
Sample
Sample TypePowder
Other Sample TypeThin films and any other polycristalline objects
Manipulator or Sample stage
Manipulator
Positioning PrecisionX = 1 [um], Y = 1 [um], Z = 1 [um]
Range Of MovementX = 15 [mm], Y = 15 [mm], Z = 5 [mm]

Sample Holders
Sample holder 1
TypeFlat plate spinner

Sample holder 2
TypeCapillary spinner


Furnace

DescriptionFurnace with an atmosphere and temperature controlled environment for powders in capillaries. The diffraction patterns are collected on a translating image plate (IP).
DiffractometerFurnace maximum temperature 1000°C.
Endstation OperativeYes
Sample
Sample TypePowder
Mounting Typecapillary (optional with controlled gas-flow )
Manipulator or Sample stage
Manipulator

Sample Environment
Sample holder Environment
Temperature300 - 1273 [K]

Sample Holders
Sample holder
TypeCapillary spinner




Detectors

fast scintillator detector

TypeFast scintillator counter
Passive or Active (Electronics)Active
Dynamic Range3 * 105 [counts/s]
Detection
Detected ParticlePhoton

marCCD

TypemarCCD-SX-165
Pixel SizeX = 80 [um], Y = 80 [um]
Array SizeX = 2048 [pixel], Y = 2048 [pixel]
Passive or Active (Electronics)Active
Dynamic Range16 [bits]
Detection
Detected ParticlePhoton

Silicon Drift Detector

TypeSilicon Drift Detector
Passive or Active (Electronics)Active
Detection
Detected ParticlePhoton



References

The X-ray diffraction beamline MCX at Elettra: a case study of non-destructive analysis on stained glass
Plaisier Jasper Rikkert, Nodari Luca, Gigli Lara, Rebollo San Miguel Elena Paz, Bertoncello Renzo, Lausi Andrea
ACTA IMEKO, Vol. 6 - 3, pp. 71-75 (2017)
doi: 10.21014/acta_imeko.v6i3.464


MCX: A synchrotron radiation beamline for X-ray diffraction line profile analysis 
Rebuffi L, Plaisier JR, Abdellatief M, Lausi A, Scardi P 
Zeitschrift fur Anorganische und Allgemeine Chemie 640  3100–3106. (2014). 
doi: 10.1002/zaac.201400163

Ultima modifica il Martedì, 19 Febbraio 2019 17:27