Pubblications

Publications in peer reviewed journals 2011 L. Malfatti, P. Falcaro, B. Marmiroli, H. Amenitsch, M. Piccinini, A. Falqui, P. Innocenzi, Nanocomposite mesoporous ordered films for lab-on-chip intrinsic surface enhanced Raman scattering detection, Nanoscale, 3, 9 (2011). P. Falcaro, A. J. Hill, K. M. Nairn, J. Jasieniak, J. I. Mardel, T. J. Bastow, S. C. Mayo, M. Gimona, D. Gomez, H. J. Whitfield, R. Riccó, A. Patelli, B. Marmiroli, H. Amenitsch, T. Colson, L. Villanova, D. Buso, A new method to position and functionalize metal-organic framework crystals, Nature Communications DOI: 10.1038/ncomms1234, (2011). S. Costacurta, P. Falcaro, L. Malfatti, D. Marongiu, B. Marmiroli, F. Cacho-Nerin, N. Kirkby, H. Amenitsch, P. Innocenzi, Shaping mesoporous films using dewetting on X-ray pre-patterned hydrophilic/hydrophobic layers and pinning effects at the pattern edge, Langmuir, 27, 3898–3905 (2011). P. Innocenzi, L. Malfatti, T. Kidchob, S. Costacurta, P. Falcaro, B. Marmiroli, F. Cacho-Nerin and H. Amenitsch, Densification of sol-gel silica thin films induced by hard X-rays generated by synchrotron radiation, J. Synchrotron Rad., 18, 280-286 (2011). P. Falcaro, S. Costacurta, L. Malfatti, D. Buso , A. Patelli, P. Schiavuta, M. Piccinini, G. Grenci, B. Marmiroli, H. Amenitsch, , P. Innocenzi, Chemical tailoring of hybrid sol-gel thick coatings as hosting matrix for functional patterned microstructures, ACS Appl. Mater. Interfaces, 3, 245-251 (2011). G. Grenci, G. Della Giustina, A. Pozzato,G. Brusatin and M. Tormen, Boehmite filled hybrid sol–gel system as directly writable hard etching mask for pattern transfer, Microelectronic Engineering, 88, 8, 1964-19767 (2011). M. Faustini, B. Marmiroli, L. Malfatti, B. Louis, N. Krins, P. Falcaro, G. Grenci, C. Laberty-Robert, H. Amenitsch, P. Innocenzi, D. Grosso, Direct nano-in-micro patterning of TiO2 thin layers and TiO2/Pt nano electrode arrays by Deep X-ray Lithography, Journal of Materials Chemistry , 21, 3597-3603 (2011). 2010 M. Faustini, M. Vayer, B. Marmiroli, M. Hillmeyer, H. Amenitsch, C. Sinturel and D. Grosso, Bottom-up approach toward Titanosilicate Mesoporous Pillared Planar Nanochannels for nanofluidic applications, Chem. Mater , 22, 20, 5687-5694 (2010). P. Innocenzi, T. Kidchob, S. Costacurta, P. Falcaro, B. Marmiroli, F. Cacho-Nerin and H. Amenitsch, Patterning block copolymer thin films by deep X-ray lithography, Soft Matter, 6, 3172-3176 (2010) (back cover) S. Costacurta, L. Malfatti, A. Patelli, P. Falcaro, H. Amenitsch, B. Marmiroli, G. Grenci, M. Piccinini, P. Innocenzi, Deep X-ray Lithography for Direct Patterning of PECVD Films, Plasma Process Polym, 7, 459-465 (2010). (front cover) L. Malfatti, D. Marongiu†, S. Costacurta, P. Falcaro, H. Amenitsch, B. Marmiroli, G. Grenci, M. F. Casula and P. Innocenzi, Writing Self-Assembled Mesostructured Films with In situ Formation of Gold Nanoparticles, Chem Mater, Vol. 22, 2132-137 (2010). 2009 P. Falcaro, L. Malfatti, L. Vaccari, H. Amenitsch, B. Marmiroli, G. Grenci, and P. Innocenzi, Fabrication of Advanced Functional Devices Combining Soft Chemistry with X-ray Lithography in One Step, Adv. Mater., 21, 48, 4932 (2009) (inside front cover) B. Marmiroli, G. Grenci, F. Cacho-Nerin, B. Sartori, E. Ferrari, P. Laggner, L. Businaro, and H.Amenitsch, Free jet micromixer to study fast chemical reactions by small angle X-ray scattering, Lab Chip, 9, 2063-2069 (2009) P. Falcaro, L. Malfatti, T. Kidchob, G. Giannini, A. Falqui, M. F. Casula, H. Amenitsch, B. Marmiroli, G. Grenci and P. Innocenzi, Hierarchical Porous Silica Films with Ultralow Refractive Index, Chemistry of Materials, Vol. 21, 2055-2061 (2009) M. Matteucci, M. Fanetti, M. Casella, F. Gramatica, L. Gavioli, M. Tormen, G. Grenci, F. De Angelis, E. Di Fabrizio, Poly vinyl alcohol re-usable masters for microneedle replication, Microelectronic Engineering, 86,4-6, 752-755 (2009). 2008 P. Falcaro, S. Costacurta, L. Malfatti, M. Takahashi , T. Kidchob, M. F. Casula, M. Piccinini, A. Marcelli, B. Marmiroli, H. Amenitsch, P. Schiavuta, P. Innocenzi, Fabrication of Mesoporous Functionalized Arrays by Integrating Deep X-Ray Lithography with Dip-Pen Writing, Advanced Materials, 20, 1864-1869, (2008). W. Jark, M. Matteucci, R. H. Menk, On the use of clessidra prism arrays in long-focal-length x-ray focusing, J. Synchrotron Rad, 15, 4, 411-413 (2008). L. De Caro, W. Jark, Diffraction theory applied to X-ray imaging with clessidra prism array lenses, J. Synchrotron Rad, 15, 2, 176-179 (2008). L. De Caro, W. Jark, R. H. Menk, M. Matteucci, Diffraction of partially coherent X-rays in clessidra prism arrays, J. Synchrotron Rad, 15,6, 606-6 (2008). 2007 M. Matteucci, F. Pérennès, B. Marmiroli, E. Di Fabrizio, A Transdermal Drug Delivery System based on LIGA Technology and Soft Lithography, Synchrotron Radiation Instrumentation: Ninth International Conference, edited by J-Y Choi and S. Rah, American Institute of Physics, 1447- 1450 (2007). M. Matteucci, T. Lakshmikanth, K. Shibu, D. Schadendorf, S. Venuta, E. Carbone, E. Di Fabrizio, F. De Angelis, Preliminary study of micromechanical stress delivery for cell biology studies, Microelectronic Engineering,84-5, 8, 1729-1734 (2007). M. Matteucci, R. Carabalona, M. Casella, E. Di Fabrizio, F. Gramatica, M. Di Rienzo, E. Snidero, L. Gavioli, M. Sancrotti, Micropatterned Dry Electrodes for Brain-Computer Interface, Microelectronic Engineering, 84-5,8, 1737-1744 (2007). 2006 F. Romanato, L. Businaro, M. Tormen, F. Pérennès, M. Matteucci, B.Marmiroli, S. Balslev, E. Di Fabrizio, Fabrication of 3D micro and nanostructures for MEMS and MOEMS: an approach based on combined lithographies, Journal of Physics: Conference Series, 34, 904-911 (2006). F. Pérennès, B. Marmiroli, M. Matteucci, M. Tormen, L. Vaccari, and E. Di Fabrizio, Sharp beveled tip hollow microneedle arrays fabricated by LIGA and 3D soft lithography with Poly vinyl alcohol, J. Micromech. Microeng., 16, 473-479 (2006). M. Matteucci, F. Pérennès, B. Marmiroli, P. Miotti, L. Vaccari, A. Gosparini, A. Turchet and E. Di Fabrizio, Compact micropumping system based on LIGA fabricated microparts, Microelectronic Engineering, 83, 1288-1290, (2006). F. Pérennès, B.Marmiroli, M Tormen, M. Matteucci, and E. Di Fabrizio, Replication of Deep X-ray Lithography fabricated microstructures through casting of soft material, invited special issue of J. Microlithogr. Microfabrication, Microsystems. 5, (2006). W. Jark, F. Perennes, M. Matteucci ,On the feasibility of large-aperture Fresnel lenses for the micro-focusing of hard x-rays, J. Synchrotron Rad, 13, 3, 239-254 (2006). 2005 S. Cabrini, F. Pérennès, B. Marmiroli, A. Olivo, A. Carpentiero, R. Kumar, P. Candeloro and E. Di Fabrizio, Low cost transparent SU-8 membrane mask for deep X-ray lithography, Microsystem Technologies, 11, 370-373 (2005). F.Pérennes, M.Matteucci, W. Jark, B. Marmiroli, Fabrication of refractive X-ray focusing lenses by Deep X-ray lithography, Microelectronic Engineering 78-79, 79-87 (2005). 2004 W. Jark, F. Perennes, M. Matteucci, L. Mancini, F. Montanari, L. Rigon, G. Tromba, A. Somogyi, R. Tucoulou, S. Bohic , Focusing x-rays with simple prism arrays, J. Synchrotron Rad, 11, 248-253 (2004). B. Marmiroli, F. Pérennès, A. Turchet, A. Gosparini, P. Miotti, M. Tajmar,M. Lang, E. Di Fabrizio, Design and Fabrication of Microturbine Rotors for Small Power Generation, Proceedings of CANEUS 2004- Conference on micro-nano technologies for aerospace applications, Monterey (California), 1-5/11/04, AIAA 2004-6710, pp 42-48. P. Miotti, M. Tajmar, C. Guraya, F. Pérennès, B. Marmiroli, A. Soldati, M. Campolo, C. Kappenstein, R. Brahmi, M. Lang, Bi-proellant Micro-Rocket Engine, Proceedings of CANEUS 2004- Conference on micro-nano technologies for aerospace applications, Monterey (California), 1-5/11/04, AIAA 2004-6707, pp 17-28. 2002 L. Vaccari, M. Altissimo, E. Di Fabrizio, F. Perennes, Design and prototyping of a micropropulsion system for microsatellites attitude control and orbit correction , J. Vac. Sci. Technol. B, 20-, 2793 (2002). F. Perennes, E. Vesselli, F.J. Pantenburg, Deep X-ray lithography at ELETTRA using a central beam-stop to enhance adhesion, Microsyst. Technol, 8, 4-5, 330-335 (2002). 2001 F. Perennes, FJ. Pantenburg, Adhesion improvement in the deep X-ray lithography process using a central beam-stop, Nucl. Instrum. Meth. B,174, 317 (2001) F. Perennes, F. De Bona, F. J. Pantenburg ,Deep X-ray lithography beamline at ELETTRA, Nucl. Instrum. Meth. A, 467, 1274 (2001). I. Cudin, F. De Bona, A. Gambitta, F. Perennes, A .Turchet , Heat load problems in deep X-ray lithography, Nucl. Instrum. Meth. A, 467, 1265 (2001). Book chapters M. Tormen, G. Grenci, B. Marmiroli, F. Romanato. X-ray Lithography: fundamentals and applications, in Nanolithography, edited by Stefan Landis, ISTE-Wiley, 2010 (in press).