Seminars Archive

Imaging at High Spatial Resolution: Soft X-Ray Microscopy and EUV Lithography

Abstract


Wednesday, March 16, 2005, 15:30
Seminar Room, ground floor, Building "T"
Sincrotrone Trieste, Basovizza
Imaging at High Spatial Resolution:

Soft X-Ray Microscopy and EUV Lithography


David Attwood

(University of California, Berkeley and Center for X-ray Optics, Lawrence Berkeley National laboratory) Abstract Soft x-ray microscopy has now achieved 15 nm spatial resolution with new zone plates and bending magnet radiation. Combined with elemental sensitivity and flexible sample environment (applied magnetic or electric fields, wet samples, windows, overcoatings) this emerges as a valuable tool for nanoscience and nanotechnology, complimenting common electron and scanning tip microscopies. In this presentation we describe recent advances in spatial resolution, expectations for the near future, and applications to magnetic materials, bio-tomography, etc. As a second topic we briefly review the progress of extreme ultraviolet (EUV) lithography, a candidate technology for high volume manufacture of 19 GHz computer chips in 2009. Present work at the Advanced Light Source in Berkeley is at the forefront of pattern printing, resist evaluation and metrologies, but substantial industrial commitment, infrastructure, and progress on key technical challenges will be needed to make this a manufacturing reality.